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Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists
Kozawa, Takahiro, Hirayama, TakuVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.086501
Date:
August, 2013
File:
PDF, 218 KB
english, 2013