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Influence of nitrogen dose on the charge density of nitrogen-implanted buried oxide in SOI wafers
Zhongshan, Zheng, Zhongli, Liu, Ning, Li, Guohua, Li, Enxia, ZhangVolume:
31
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/31/2/026001
Date:
February, 2010
File:
PDF, 316 KB
english, 2010