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Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Pret, Alessandro VaglioVolume:
10
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3603992
Date:
July, 2011
File:
PDF, 562 KB
english, 2011