Dependence of wet etch rate on deposition, annealing...

Journal of Semiconductors 2009 / 09 Vol. 30; Iss. 9

Dependence of wet etch rate on deposition, annealing conditions and etchants for PECVD silicon nitride film

Longjuan, Tang, Yinfang, Zhu, Jinling, Yang, Yan, Li, Wei, Zhou, Jing, Xie, Yunfei, Liu, Fuhua, Yang
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Volume:
30
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/30/9/096005
Date:
September, 2009
File:
PDF, 321 KB
english, 2009
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