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SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Contamination and damage of silicon surfaces during magnetron-enhanced reactive ion etching in a single-wafer system
Tan, Swie-In, Colavito, D. B., Bondur, James A., Turner, Terry R.Volume:
1392
Year:
1991
Language:
english
DOI:
10.1117/12.48965
File:
PDF, 590 KB
english, 1991