E-beam lithography and electrodeposition fabrication of thick nanostructured devices
Lo, T N, Chen, Y T, Chiu, C W, Liu, C J, Wu, S R, Lin, I K, Su, C I, Chang, W D, Hwu, Y, Shew, B Y, Chiang, C C, Je, J H, Margaritondo, GVolume:
40
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/40/10/021
Date:
May, 2007
File:
PDF, 321 KB
english, 2007