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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Sensitivity analysis of fitting for scatterometry
Logofatu, Petre-Catalin, McNeil, John R., Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350805
File:
PDF, 313 KB
english, 1999