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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°
Brunsvold, W., Conley, W., Crockatt, D., Iwamoto, N., Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953048
File:
PDF, 2.16 MB
english, 1989