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SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Plasma diagnostics as inputs to the modeling of the oxygen reactive ion etching of multilevel resist structures
Hope, D. A. O., Hydes, A. J., Cox, Tim I., Deshmukh, V. G. I., Bondur, James A., Turner, Terry R.Volume:
1392
Year:
1991
Language:
english
DOI:
10.1117/12.48913
File:
PDF, 413 KB
english, 1991