Ultrafine Particle Removal Using Gas Cluster Ion Beam Technology
Dobashi, Kazuya, Inai, Kensuke, Saito, Misako, Seki, Toshio, Aoki, Takaaki, Matsuo, JiroVolume:
26
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2013.2268871
Date:
August, 2013
File:
PDF, 742 KB
english, 2013