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Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability
Terasawa, Tsuneo, Arisawa, Yukiyasu, Amano, Tsuyoshi, Yamane, Takeshi, Watanabe, Hidehiro, Toyoda, Mitsunori, Harada, Tetsuo, Kinoshita, HirooVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.096601
Date:
September, 2013
File:
PDF, 912 KB
english, 2013