![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Chemical amplification negative resist systems composed of novolac, silanols, and acid generators
Ueno, Takumi, Shiraishi, Hiroshi, Hayashi, Nobuaki, Tadano, Keiko, Fukuma, Emiko, Iwayanagi, Takao, Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20085
File:
PDF, 296 KB
english, 1990