Improvement in Etch Rate Uniformity Using Resistive Electrodes with Multistep Cavity
Koshiishi, Akira, Himori, Shinji, Iijima, TamotsuVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.46.4289
Date:
July, 2007
File:
PDF, 127 KB
english, 2007