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Charateristics of Low Temperature High Quality Silicon Oxide by Plasma Enhanced Atomic Layer Deposition with In Situ Plasma Densification Process
Kim, H., Zaretskiy, S. N., Shin, S., Jung, W., Hwang, R., Jeong, C., Park, S., Hwang, H., Chung, I.Volume:
53
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/05301.0321ecst
Date:
May, 2013
File:
PDF, 16.60 MB
english, 2013