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Effect of Duty Cycle on Characteristics of CrN x Thin Films Deposited by Pulsed Direct Current Reactive Magnetron Sputtering
Chang, Chi-Lung, Wu, Bo-Yi, Chen, Pin-Hung, Chen, Wei-Chih, Ho, Chun-Ta, Wu, Wan-YuVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.11NB08
Date:
November, 2013
File:
PDF, 1007 KB
english, 2013