Simulation of the 45-nm half-pitch node with 193-nm immersion lithography—imaging interferometric lithography and dipole illumination
Biswas, AbaniVolume:
3
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.1631007
Date:
January, 2004
File:
PDF, 931 KB
english, 2004