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Inductively coupled plasma etching of hafnium–indium–zinc oxide using chlorine based gas mixtures
Choi, Yong-Hee, Jang, Ho-Kyun, Jin, Jun-Eon, Joo, Min-Kyu, Piao, Mingxing, Shin, Jong Mok, Kim, Jae-Sung, Na, Junhong, Kim, Gyu TaeVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.046503
Date:
April, 2014
File:
PDF, 801 KB
english, 2014