Inductively coupled plasma etching of hafnium–indium–zinc...

Japanese Journal of Applied Physics 2014 / 04 Vol. 53; Iss. 4

Inductively coupled plasma etching of hafnium–indium–zinc oxide using chlorine based gas mixtures

Choi, Yong-Hee, Jang, Ho-Kyun, Jin, Jun-Eon, Joo, Min-Kyu, Piao, Mingxing, Shin, Jong Mok, Kim, Jae-Sung, Na, Junhong, Kim, Gyu Tae
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.046503
Date:
April, 2014
File:
PDF, 801 KB
english, 2014
Conversion to is in progress
Conversion to is failed