Mask-induced polarization effects at high numerical...

Journal of Micro/Nanolithography MEMS and MOEMS 2005 / 07 Vol. 4; Iss. 3

Mask-induced polarization effects at high numerical aperture

Estroff, Andrew
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Volume:
4
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2037507
Date:
July, 2005
File:
PDF, 816 KB
english, 2005
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