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Chemical Mechanical Polishing of Low Dielectric Constant Oxide Films Deposited Using Flowfill Chemical Vapor Deposition Technology
Cui, Hao, Bhat, Ishwara B., Murarka, Shyam P., Lu, Hongqiang, Li, Weidan, Hsia, Wei-Jen, Catabay, WilburVolume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1393978
File:
PDF, 195 KB
english, 2000