Chemical Mechanical Polishing of Low Dielectric Constant...

Chemical Mechanical Polishing of Low Dielectric Constant Oxide Films Deposited Using Flowfill Chemical Vapor Deposition Technology

Cui, Hao, Bhat, Ishwara B., Murarka, Shyam P., Lu, Hongqiang, Li, Weidan, Hsia, Wei-Jen, Catabay, Wilbur
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Volume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1393978
File:
PDF, 195 KB
english, 2000
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