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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Resist loss in 3D compact modeling
Zheng, Xin, Huang, Jensheng, Chin, Fook, Kazarian, Aram, Kuo, Chun-Chieh, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.916582
File:
PDF, 691 KB
english, 2012