![](/img/cover-not-exists.png)
Nebulous hotspot and algorithm variability in computation lithography
Wong, Alfred K.Volume:
9
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3459937
Date:
July, 2010
File:
PDF, 356 KB
english, 2010