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Wet Chemical Etching and X-ray Photoelectron Spectroscopy Analysis of BaSi 2 Epitaxial Films Grown by Molecular Beam Epitaxy
Saito, Takanobu, Tsukada, Dai, Matsumoto, Yuta, Sasaki, Ryo, Takeishi, Michitoshi, Ootsuka, Teruhisa, Suemasu, TakashiVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.106507
Date:
October, 2009
File:
PDF, 303 KB
english, 2009