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Fermi Level Unpinning and Schottky Barrier Modification by Ti, Sc and V Incorporation at NiSi 2 /Si Interface
Li, Geng, Blanka, Magyari-Kope, Zhi-Yong, Zhang, Yoshio, NishiVolume:
26
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/26/3/037306
Date:
March, 2009
File:
PDF, 118 KB
english, 2009