Erratum: ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor [J. Electrochem. Soc., 153, C701 (2006)]
Katamreddy, Rajesh, Inman, Ronald, Jursich, Gregory, Soulet, Axel, Takoudis, ChristosVolume:
154
Year:
2007
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2536622
File:
PDF, 37 KB
english, 2007