Atomic diffusion in annealed CU/SiO 2...

Chinese Physics B 2010 / 02 Vol. 19; Iss. 2

Atomic diffusion in annealed CU/SiO 2 /Si (100) system prepared by magnetron sputtering

Bo, Cao, Yan-Hui, Jia, Gong-Ping, Li, Xi-Meng, Chen
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Volume:
19
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/19/2/026601
Date:
February, 2010
File:
PDF, 487 KB
english, 2010
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