Effects of plasma-induced charging damage on random...

Effects of plasma-induced charging damage on random telegraph noise in metal–oxide–semiconductor field-effect transistors with SiO 2 and high- k gate dielectrics

Kamei, Masayuki, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi
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Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.03DF02
Date:
January, 2014
File:
PDF, 1.23 MB
english, 2014
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