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Methods for joint optimization of mask and design targets for improving lithographic process window
Banerjee, Shayak, Agarwal, Kanak B., Orshansky, MichaelVolume:
12
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.12.2.023014
Date:
June, 2013
File:
PDF, 5.05 MB
english, 2013