![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - All-dry resist processes for 193-nm lithography
Horn, Mark W., Maxwell, Brian E., Kunz, Roderick R., Hibbs, Michael S., Eriksen, Lynn M., Palmateer, Susan C., Forte, Anthony R., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210368
File:
PDF, 215 KB
english, 1995