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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Model based multilayers fix for litho hotspots beyond 20nm node
Sturtevant, John L., Capodieci, Luigi, Rabie, Asmaa, Madkour, Kareem, George, Kirolos, ElManhawy, Wael, Brunet, Jean-Marie, Kwan, JoeVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2045744
File:
PDF, 403 KB
english, 2014