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Monte Carlo Simulation of Electron Velocity Distribution and Gas Phase Process in Electron-Assisted Chemical Vapor Deposition
Lifang, Dong, Boqin, Ma, Yong, Shang, Zhijun, WangVolume:
7
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/7/3/014
Date:
June, 2005
File:
PDF, 610 KB
english, 2005