Relation Between Oxidation Rate and Oxidation-Induced Strain at SiO 2 /Si(001) Interfaces during Thermal Oxidation
Ogawa, Shuichi, Tang, Jiayi, Yoshigoe, Akitaka, Ishidzuka, Shinji, Teraoka, Yuden, Takakuwa, YujiVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.110128
Date:
November, 2013
File:
PDF, 289 KB
english, 2013