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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Impact of the phase defect structure on an actinic dark-field blank inspection signal and wafer printability
Amano, Tsuyoshi, Murachi, Tetsunori, Yamane, Takeshi, Arisawa, Yukiyasu, Terasawa, Tsuneo, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916309
File:
PDF, 967 KB
english, 2012