About the EDF formation in a capacitively coupled argon plasma
Tatanova, M, Thieme, G, Basner, R, Hannemann, M, Golubovskii, Yu B, Kersten, HVolume:
15
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/15/3/029
Date:
August, 2006
File:
PDF, 516 KB
english, 2006