SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Interface creation to build a powerful photolithography simulation platform
Costes, Marie-Sophie, Braun, Gerhard, Cuinet, Xavier, Fossati, Caroline, Liotard, Jean-Luc, Commandré, Mireille, Weed, J. Tracy, Martin, Patrick M.Volume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.631282
File:
PDF, 443 KB
english, 2005