SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - High-sensitivity EUV resists based on fluorinated polymers
Yamashita, Tsuneo, Allen, Robert D., Somervell, Mark H., Morita, Masamichi, Tanaka, Yoshito, Santillan, Julius Joseph, Itani, ToshiroVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879568
File:
PDF, 709 KB
english, 2011