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157 nm lithography with high numerical aperture lens for the 70 nm technology node
Suganaga, ToshifumiVolume:
1
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.1501565
Date:
October, 2002
File:
PDF, 583 KB
english, 2002