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Use of a neural network to model SiC etching in a NF 3 inductively coupled plasma
Kim, Byungwhan, Lee, Byung Teak, Han, Jeon Gun, Kim, Nam Jeung, Choi, Seongjin, Han, Seong-SooVolume:
13
Language:
english
Journal:
Modelling and Simulation in Materials Science and Engineering
DOI:
10.1088/0965-0393/13/8/005
Date:
January, 2005
File:
PDF, 1.23 MB
english, 2005