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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Chalcogenide glass thin film resists for grayscale lithography
Kovalskiy, A., Cech, J., Tan, C. L., Heffner, W. R., Miller, E., Waits, C. M., Dubey, M., Churaman, W., Vlcek, M., Jain, H., Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.811646
File:
PDF, 1.92 MB
english, 2009