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SPIE Proceedings [SPIE 1984 Microlithography Conferences - Santa Clara (Monday 12 March 1984)] Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III - Si MOSFET Fabrication Using Focused Ion Beams
Kubena, R L., Lee, J Y., Jullens, R A., Brault, R G., Middleton, P L., Stevens, E H., Wagner, AlfredVolume:
471
Year:
1984
Language:
english
DOI:
10.1117/12.942315
File:
PDF, 7.41 MB
english, 1984