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Activation of boron and recrystallization in Ge preamorphization implant structure of ultra shallow junctions by microwave annealing
Tsai, Ming Han, Wu, Chi-Ting, Lee, Wen-HisVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.041302
Date:
April, 2014
File:
PDF, 4.41 MB
english, 2014