Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media
Yang, XiaoMin, Xiao, Shuaigang, Hu, Wei, Hwu, Justin, van de Veerdonk, René, Wago, Koichi, Lee, Kim, Kuo, DavidVolume:
25
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/25/39/395301
Date:
September, 2014
File:
PDF, 242 KB
english, 2014