Characterization of K+ and Na+-Sensitive Membrane Fabricated by CF4 Plasma Treatment on Hafnium Oxide Thin Films on ISFET
Lu, Tseng-Fu, Yang, Chia-Ming, Wang, Jer-Chyi, Ho, Kuan-I, Chin, Chi-Hung, Pijanowska, Dorota G., Jaroszewicz, Bohdan, Lai, Chao-SungVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3543922
File:
PDF, 1.59 MB
english, 2011