Thermal Annealing Behavior of Helium in Ti Films Deposited...

Chinese Physics Letters 2012 / 01 Vol. 29; Iss. 1

Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering

Zhang, Lei, He, Zhi-Jiang, Liu, Chao-Zhuo, Wang, Xu-Fei, Shi, Li-Qun
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Volume:
29
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/29/1/012501
Date:
January, 2012
File:
PDF, 333 KB
english, 2012
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