![](/img/cover-not-exists.png)
New stochastic post-exposure bake simulation method
Henke, WolfgangVolume:
4
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2136867
Date:
October, 2005
File:
PDF, 6.36 MB
english, 2005