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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Contact hole reticle optimization by using interference mapping lithography (IML)
Socha, Robert J., Van Den Broeke, Douglas J., Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong, Conley, Will, Smith, Bruce W.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536581
File:
PDF, 1018 KB
english, 2004