Plasma Processing of Functional Thin Films by Sputtering...

Japanese Journal of Applied Physics 2013 / 11 Vol. 52; Iss. 11S

Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target

Kawasaki, Hiroharu, Ohshima, Tamiko, Ihara, Takeshi, Arafune, Kento, Taniyama, Daichi, Yagyu, Yoshihito, Suda, Yoshiaki
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.11NB07
Date:
November, 2013
File:
PDF, 813 KB
english, 2013
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