Electrical properties and microstructure of vanadium-based contacts on ICP plasma etched n-type AlGaN:Si and GaN:Si surfaces
Lapeyrade, Mickael, Muhin, Anton, Einfeldt, Sven, Zeimer, Ute, Mogilatenko, Anna, Weyers, Markus, Kneissl, MichaelVolume:
28
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/28/12/125015
Date:
December, 2013
File:
PDF, 818 KB
english, 2013