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Laser annealing of thin film electroluminescent devices deposited at a high rate using high target utilization sputtering
Wakeham, S J, Tsakonas, C, Cranton, W M, Thwaites, M J, Boutaud, G, Koutsogeorgis, D CVolume:
26
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/26/4/045016
Date:
April, 2011
File:
PDF, 183 KB
english, 2011