Synthesis, characterization and radiation damage studies of...

Radiation Effects and Defects in Solids 2015 / 03 Vol. 170; Iss. 3

Synthesis, characterization and radiation damage studies of high-k dielectric (HfO 2 ) films for MOS device applications

Manikanthababu, N., Arun, N., Dhanunjaya, M., Saikiran, V., Nageswara Rao, S.V.S., Pathak, A.P.
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Volume:
170
Language:
english
Journal:
Radiation Effects and Defects in Solids
DOI:
10.1080/10420150.2014.980259
Date:
March, 2015
File:
PDF, 906 KB
english, 2015
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