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Formation of Oxide Films on the Surface of Electroconductive Si3N4-TiN and Si3N4-TiB2 Materials under Electrochemical Polarization in a 3% NaCl Solution
Lavrenko, Vladimir, Desmaison-Brut, Martine, Shvets, V.A., Desmaison, Jean, Klein, R.Volume:
264-268
Year:
2004
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.264-268.513
File:
PDF, 458 KB
english, 2004